Gas Purification

Gases used in semiconductor manufacture are required to meet a specified purity to protect product quality. Accurate monitoring of any trace-level contamination during the production process ensures the necessary quality is achieved.

Manufacturers demand assured purity from the purified gases used. Fast, precise and reliable analysis of the gas must be carried out to ensure impurities remain within specified, very low limits.

Among the many trace impurities that must be measured are moisture, oxygen, hydrogen, carbon monoxide, carbon dioxide and hydrocarbons. In particular, gas separation requires specific monitoring for moisture and oxygen to ensure product quality.

We provide analytical solutions to monitor moisture and oxygen, using proven technologies for continuous, reliable, and accurate measurements.


  • Application +


    Quality

    The aim of gas purification is to ensure the required level of product quality. Monitoring the trace contamination from moisture and other compounds using a range of technologies helps determine the final quality.

    Recommended products: 2850, 3050-AM, 5800, 5830, 5910, 5920, ta3000, ta5000, ta7000

    Trace oxygen monitoring

    Oxygen is highly reactive, so its presence in an inert gas is undesirable. It is important to monitor inert gases for trace O2 impurities to ensure gas quality.

    Recommended products: CG1000, TM2000